RF Devices (Ferroelectric) Fabrication Facility (Holmes Hall 306)

This new lab facility includes:

  • Sputter deposition chamber for Ferroelectric films

  • An M150 Probe station for microelectronic and RF devices characterization

This facility has been developed to support “The development of high performance low cost phase array antenna with beam steering capabilities” project. The project design involved integrating the Ferroelectric material and the Continuous Transverse Stub (CTS) antenna array technologies. Figure 1 shows an example of the proposed design, while figure 2 shows the developed lab facility.


Figure 1. Antennas integrated with ferroelectric phase shifters



Figure 2. Sputtering chamber (left), RF probe station (right) used for fabrication and characterization

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